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Paul, Weiss v. Davis Polk v. S&C - Employment Litigation

Posted: Thu Jan 04, 2024 7:17 pm
by Anonymous User
I was curious whether Paul, Weiss, Davis Polk or Sullivan & Cromwell does best with respect to employment litigation work. Any other v20s that are strong in this area?

Re: Paul, Weiss v. Davis Polk v. S&C - Employment Litigation

Posted: Sun Jan 07, 2024 2:50 pm
by Anonymous User
Ex-PW. We do internal investigations work for our clients which sometimes includes employment issues (harassment, etc). We have one NY partner who does employment work (Liza Velazquez) and the website suggests we do more than I thought we did, but it's hardly a focus.

I don't know what you mean by "does best" but I think that if you're serious about practicing employment you should look elsewhere. None of the firms you suggested are even ranked on Chambers for employment law.

Re: Paul, Weiss v. Davis Polk v. S&C - Employment Litigation

Posted: Mon Jan 08, 2024 10:04 am
by Bramwell
I agree with anonymous reply above. These are all top flight firms, just not places I’d go if I was solely interested in employment litigation and wanted to train under top practitioners in that space.

Re: Paul, Weiss v. Davis Polk v. S&C - Employment Litigation

Posted: Mon Jan 08, 2024 3:42 pm
by Anonymous User
These firms don't do a lot of employment work. Of the firms in the V20 I would suggest Gibson or Jones Day if you want to focus on employment litigation.

Re: Paul, Weiss v. Davis Polk v. S&C - Employment Litigation

Posted: Wed Jan 10, 2024 9:32 pm
by Anonymous User
Anonymous User wrote:
Mon Jan 08, 2024 3:42 pm
if you want to focus on employment litigation.
This being key. Why you would want to do employment litigation, I don't know.

Re: Paul, Weiss v. Davis Polk v. S&C - Employment Litigation

Posted: Thu Jan 11, 2024 11:41 am
by Anonymous User
Interestingly, Paul, Weiss is representing DPW in an employment litigation trial that is going on right now about the discriminatory termination of a DPW associate. But no one represents themselves.